Pulsed laser deposition (PLD) is a deposition process using high power pulsed laser to ablate material for a target which is then deposited onto a substrate. In this project a standard PLD setup as depicted here was used for characterizing the process then a for deposition inside quartz tubes was developed. PLD can be used to deposit a wide range of materials from polymers to metals. A couple of unique characteristics are the deposited particles high kinetic energy (~100 eV) and the wide deposition temperature range (0-1000 C). Films made PLD can be extremely smooth and amorphous, or crystalline depending on the chamber atmosphere. |